For measuring thickness of a layer, the lab offers a combination of both spectroscopic and imaging techniques for varying scales:
- 1 monolayer – >1 μm film: Woollam Variable Angle Spectroscopic ellipsometer
- ~1 nm – 10 nm: Kratos Axis Ultra XPS using calculation for top layer attenuation
- 10 nm – 100 nm: Kratos Axis Ultra XPS using depth profiling
- ~10 μm: JEOL JEM 2800 S/TEM imaging with FIB Helios Nanolab 650 and Quanta 650 SEM Samples will have to be cross sectioned and polished. The lab has sectioning and polishing tools that you can use for sample preparation.